半导体材料制备，器件物理，光电器件

2008-2012 天津大学，化学专业，理学学士

2012-2015 天津大学，应用化学专业，工学硕士

2015-2017 中国电子科技基团公司第18研究所 助理工程师

2017-2021 天津大学，化学专业，理学博士

2021-2026 新加坡科技局（A*STAR），材料工程研究所（IMRE）2026-至今 304永利集团官网，304永利集团，副教授

1.晶圆级二维晶体膜制备，提升晶体管阵列一致性与构建存算一体神经网络

M. Chen*, X. Li†, Y. He†, H. Zheng, Z. Cai, X. Ju, M. Zeng, S. W. Tong, J. Wu, L. Wang*, K.-W. Ang*, D. Chi*, Wafer-Scale Monolayer MoS2 with Tunable Grain Size via Grain Boundary Engineering for Neuromorphic Computing. ACS Nano, 2025, 19, 41407-41417.

G. Huang†, R. Chen†, M. Chen†, X. Chen, M. Jiang, Y. Xing, J. Wang, B. Liang, Q. Liu, X. Li, C. S. Lau, X. Dong, P. Agarwal, L. Ke, J.-R. Soh, J. Lourembam, Y.-W. Cho, Q. Liang*, J. Li*, X. Zhang*, Y. Ma*, Y. Lu*, P. K. Lam*, X. Ma*, Transfer and beyond: emerging strategies and trends in two-dimensional material device fabrication. Chem. Soc. Rev. 2026, 55, 2574-2634.

M. Chen, J. Chai, J. Wu, H. Zheng, W.-Y. Wu, J. Lourembam, M. Lin, J.-Y. Kim, J. Kim, K.-W. Ang, M.-F. Ng, H. Medina*, S. W. Tong*, D. Chi*, Sublimation-Based Wafer-Scale Monolayer WS₂ Formation via Self-Limited Thinning of Few-layer WS₂. Nanoscale Horiz.2024, 9, 132-142.

S. W. Tong†*, M. Chen†, X. Ju, J. Chai, J.-Y. Kim, J. Kim, H. K. Ng, B. Y. H. Tan, D. Chi*, Wafer-Scale Integration of Monolayer MoS₂ via Residue-Free Support Layer Etching and Angular Strain Suppression. Nanoscale2025, 17, 21554-21564. 

2.厘米级有机晶体制备，分子设计增强X射线探测与成像性能

 M. Chen, L. Sun, X. Ou, H. Yang, X. Liu, H. Dong, W. Hu*,X. Duan*, Organic Semiconductor Single Crystals for X-Ray Imaging. Adv. Mater.2021, 33, 2104749. 

M. Chen*, C. Wang, H Wang, Z Hong, J. Wu, D. Chi, H. Yang, Y. Sun*, W. Hu*, Organic Crystals with Methyl Lock Effect for High-Efficiency X-Ray Scintillation and Advanced Anti-Counterfeiting. Small, 2025, 21, 2504013. 

M. Chen*, L. Sun, Z. Hong, H. Wang, Y. Xia, S. Liu, X. Ren, X. Zhang, D. Chi, H. Yang, W. Hu*, Anthracene Single-Crystal Scintillators for Computer Tomography Scanning. ACS Appl. Mater. Interfaces2022, 14, 41275-41282. 

M. Chen, C. Wang, W. Hu*, Organic Photoelectric Materials for X-Ray and Gamma-ray Detection: Mechanism, Material Preparation and Application. J. Mater. Chem. C, 2021, 9, 4709-4729.